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在硅太阳电池表面涂敷一层折射率适当的透明介质薄膜,可以在很宽波长范围内降低反射率。一般认为,Ta_2O_5膜是比较理想的,它是一种稳定的非晶结构氧化物,其折射率约为2.10—2.26,在短波范围有良好的透明度。加封装玻璃盖片后,增透效果显著。把它用于浅结高效电池,尤能显示出优越性。 一、制备工艺 当溅射室处在高真空时,充入适当分压的氧、氩混合气体,加以一定的电压使气体电离,轰击作为靶材的金属钽板,便可制得性能满意的Ta_2O_5膜。在反应溅射过程中,溅射电压、
In the silicon solar cell surface coated with a layer of transparent medium refractive index suitable medium, can reduce the reflectance in a wide range of wavelengths. It is generally believed that the Ta 2 O 5 film is ideal. It is a stable amorphous structure oxide with a refractive index of about 2.10-2.26 and good transparency in the short wave range. After sealing the glass cover, the anti-penetration effect is remarkable. It is used to shallow efficient batteries, especially shows the superiority. First, the preparation process When the sputtering chamber at high vacuum, filled with the appropriate partial pressure of oxygen, argon mixed gas to a certain voltage to ionize the gas, bombardment as a target of metal tantalum plate, can be prepared with satisfactory performance Ta_2O_5 film. In the reactive sputtering process, the sputtering voltage,