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VO_2是一种相变温度为68℃接近室温的热致相变材料,具有十分广泛的潜在应用价值,自从被发现以来针对它的研究就从未停止。如何使用恰当的制备方法简单、快速的制备性能良好的VO_2薄膜一直是研究的热点之一。目前,VO_2薄膜常见的制备方法主要有蒸发法、溶胶-凝胶法、脉冲激光沉积工艺、分子束外延法及磁控溅射法等。本文详细介绍了每种方法的相应制备原理与国内外研究现状,并用表格的方式简洁明了地对比出每种方法的优势与不足,为不同条件下VO_2薄膜的制备方法的选择提供了参考。同时,本文也对未来研究方向做出展望,对今后VO_2薄膜的制备与应用研究有重要的借鉴意义。
VO_2 is a phase change temperature of 68 ℃ near room temperature thermal phase change material, has a very wide range of potential applications, since its discovery has never ceased its research. How to use the proper preparation method to prepare the VO_2 thin film with good performance has always been one of the hot topics. At present, the common preparation methods of VO_2 thin films are mainly evaporation, sol-gel, pulsed laser deposition, molecular beam epitaxy and magnetron sputtering. In this paper, the corresponding preparation principle and domestic and foreign research status of each method are introduced in detail, and the advantages and disadvantages of each method are compared concisely and clearly, which provides a reference for the preparation of VO_2 thin films under different conditions. At the same time, this article also makes a prospect for the future research direction, which is of great reference significance for the future research on the preparation and application of VO_2 thin films.