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金属纳米结构表现出独特的光电效应,在表面等离激元器件、超分辨光学成像、全光集成等领域有广泛应用。针对一种有实际需求的金碗-金豆(PIC)高分辨纳米腔的研制,提出了基于室温纳米压印技术,结合多参数各向异性刻蚀技术,研究并解决金碗-金豆多尺度纳米结构加工中关键工艺技术问题。利用双层抗刻蚀剂硅水合物(HSQ)/聚丙烯酸甲酯-聚苯乙烯嵌段共聚物(PMMA-b-PS)在刻蚀工艺中的物化性能转变和差异,发展了多参数刻蚀技术,构造出了直径120 nm渐变的碗形金属结构,同步制备了每个碗中只含一个直径约20 nm金豆,有效避免了刻蚀工艺中纳米颗粒的侧向堆积,提高了器件实际应用品质。
Metal nanostructures exhibit unique photoelectric effect and are widely used in the field of surface plasmon elements, super-resolution optical imaging and all-optical integration. Aiming at the development of a high-resolution nanowell with gold bowls and gold beans (PIC), a real-time nano-gold bowl was proposed. Based on the nano-imprinting technique at room temperature and multi-parameter anisotropic etching technology, Scaling nanostructures in the key process technology issues. Based on the change and difference of physical and chemical properties of HSQ / PMMA-PS copolymer in the etching process, a multi-parameter etching Etching technology to construct a bowl-shaped metal structure with a diameter of 120 nm graduated. Simultaneously, only one gold bean with a diameter of about 20 nm is prepared in each bowl, which effectively avoids lateral accumulation of the nano-particles in the etching process and improves the device Practical application of quality.