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用磁控溅射技术制备薄膜 ,用X射线衍射研究在基片和靶间距离固定的情况下不同的溅射功率对薄膜结构的影响。结果表明 :过低的溅射功率下淀积的薄膜有畸变的X射线衍射特征峰 ,特征峰强度小 ,半峰全宽大。而比较高溅射功率得到的薄膜有比较尖锐的X射线衍射特征峰 ,强度高和半峰全宽非常窄。研究表明 ,X射线衍射特征峰强度小和半峰全宽大的薄膜结构疏松 ,而强度高和半峰全宽非常窄的薄膜结构致密。
The films were prepared by magnetron sputtering and the effect of different sputtering powers on the structure of the films was investigated by X-ray diffraction with a fixed distance between the substrate and the target. The results show that the films deposited under too low sputtering power have the characteristic peaks of X-ray diffraction distortion with small characteristic peak and large full width at half maximum. The films with higher sputtering power have sharp X-ray diffraction peaks with high intensity and very narrow full width at half maximum. The results show that the structure of the films with small peak intensity and full width at half maximum of X - ray diffraction is loose, while the films with high strength and very narrow full width at half maximum are compact.