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通过对原有的热蒸发镀作简单经济的改装后获得了一个新的离子镀系统。通过对各种金属元素如Zn、Al和Ti的蒸发,我们首先试验了这一系统的性能。蒸发元素的离化率在没有任何惰性气体的情况下大大提高,制备薄膜时的基体负偏压和温度也降低。系统的实际性能在制备广泛应用于装饰和刀具的TiN和TiC薄膜中进行了验证,整个膜成份及逐层膜成份、表面和断面形貌和膜的组织结构用扫描俄歇探针(包括惰性气体渗层剖面),X-射线光电光谱,二次离子质谱和X-射线衍射进行了分析。已确定了5种典型颜
A new ion plating system was obtained by simple and economical modification of the original thermal evaporation plating. Through the evaporation of various metal elements such as Zn, Al and Ti, we first tested the performance of this system. The ionization rate of the evaporated element is greatly increased without any inert gas, and the substrate negative bias and the temperature at the time of preparing the thin film also decrease. The actual performance of the system was verified in the preparation of TiN and TiC films widely used in decoration and cutting tools. The entire film composition and layer-by-film composition, surface and cross-sectional morphology and the structure of the film were characterized with scanning Auger probes (including inert Gas permeation profile), X-ray photoelectron spectroscopy, secondary ion mass spectrometry and X-ray diffraction. Five typical colors have been identified