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用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜,并对部分单层膜进行了真空退火.分别采用X射线衍射(XRD),Lambda 900光谱仪和355 nm Nd∶YAG脉冲激光测试了薄膜的晶体结构、透射光谱和激光损伤阈值(LIDT),并通过透射光谱计算得到样品的折射率和消光系数.实验结果表明,增大沉积速率有利于LaF3薄膜的结晶和择优生长,可以提高薄膜的致密性和折射率,但薄膜的抗激光损伤能力有所下降;沉积速率太大,又会恶化薄膜的结晶性能,同时薄膜中产生大量孔洞,薄膜的机械强度降低,导致薄膜的折射率减小和抗激光损伤能力降低.真空退火对薄膜的抗激光损伤能力有不同程度的提高.
LaF3 monolayer films were prepared by thermal boat evaporation at different deposition rates and some of the monolayer films were vacuum annealed by X-ray diffraction (XRD), Lambda 900 spectrometer and 355 nm Nd: YAG pulsed laser The crystal structure, transmission spectrum and laser damage threshold (LIDT) of the films were measured and the refractive index and extinction coefficient of the samples were calculated by transmission spectra.The experimental results show that increasing the deposition rate is conducive to the crystallization and preferential growth of LaF3 thin films, The compactness and the refractive index of the film, but the ability of the film to resist laser damage decreases; the deposition rate is too large, will deteriorate the crystalline properties of the film, while a large number of holes in the film, the film reduces the mechanical strength, resulting in film refractive index Reducing and anti-laser damage ability to reduce the vacuum annealing anti-laser film on the ability to varying degrees of improvement.