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利用无大颗粒的金属等离子体浸没增强沉积技术 ,在Si基体上进行动态离子束增强沉积NbN ,在低温下制成了NbN薄膜 .薄膜表面细密光滑 ,退火前其硬度 >16 .8MN·mm- 2 ,退火后硬度 >16 .0MN·mm- 2 .
Using large particles of metal plasma enhanced immersion deposition technology, the dynamic enhancement of ion beam deposition on the Si substrate NbN, made of NbN film at low temperature thin film surface smooth, annealed before its hardness> 16. 8MN · mm- 2, the hardness after annealing> 16 .0MN · mm-2.