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住友重机械工业与日本板硝子共同开发了STN型液晶显示板用ITO膜的新成膜技术-离子镀膜法.迄今,ITO膜几乎都是用溅射法制备的,但这种方法限制了在低温下高速制备低电阻膜的可能性.这种新的成膜方法代替了溅射法,适应了大画面、高精细化的要求.由于采用了名古屋大学浦本上进开发的压力锥形枪作等离子源,可以在低温下高速成膜.住友重工为了在成膜空间形成均质的等离子体,引入了等离子束修正装置,实现了等离子束的方式控制,日本板硝子制定了高质
Sumitomo Heavy Machinery Co., Ltd. and Japan Plate Co., Ltd. jointly developed a new film-forming technique for ITO film for STN LCD panels - ion plating method. To date, almost all of ITO films have been prepared by sputtering. However, The possibility of high-speed preparation of low-resistance film. This new film-forming method instead of the sputtering method to adapt to the large screen, high precision requirements due to the use of Nagoya University PTP advanced pressure cone gun for plasma Source, high-speed film formation at low temperature. Sumitomo Heavy Industries in order to form a homogeneous plasma in the film-forming space, the introduction of a plasma beam correction device to achieve the plasma beam mode control, the Japanese plate glass made high-quality