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采用射频氧等离子体(RFOP)处理对氧化铟锡(ITO)薄膜表面进行改性,通过原子力显微镜、X射线光电子能谱、X射线衍射仪和接触角仪等测试表征,研究了改性对ITO表面性质的影响。实验结果表明,RFOP处理优化了ITO表面的化学组分,提高了ITO表面的平整度,改善了ITO表面的物理化学性质。同时,通过接触角监测和表面能计算,研究了ITO表面RFOP改性的时效性,结果证实,ITO表面优化后的物理化学性质随存放时间增加而逐渐退化。另外,采用改性后不同存放时间的ITO衬底作为阳极,制备了有机发光器件,通过测量光电特性,进一步研究了ITO表面性质对器件性能的影响。
The surface of indium tin oxide (ITO) thin films was modified by radio frequency oxygen plasma (RFOP). The surface morphology of the films was characterized by atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction and contact angle meter. Effect of surface properties. The experimental results show that RFOP treatment optimizes the chemical composition of the ITO surface, improves the flatness of the ITO surface and improves the physicochemical properties of the ITO surface. At the same time, the timeliness of RFOP modification on ITO surface was studied by contact angle monitoring and surface energy calculation. The results confirmed that the optimized physicochemical properties of ITO surface gradually degenerated with the increase of storage time. In addition, an organic light-emitting device was prepared by using an ITO substrate with different storage times as an anode. The influence of the surface properties of ITO on the performance of the device was further studied by measuring the photoelectric properties.