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应用直流磁控溅射在石英玻璃上生长AZO薄膜,利用X射线双晶衍射(XRD)、四探针以及可见光分光光度计,对薄膜结构特性、光学以及电学特性进行了分析,并讨论了溅射时间对薄膜晶体结构、膜厚、方块电阻以及透过率的影响。针对AZO在LED中作为电流扩展层的应用,利用光学模拟软件TFCalc对AZO以及SiO2构成的双层膜的透过率进行了模拟,用溅射和PECVD分别生长AZO以及SiO2薄膜加以验证。通过适当的调节薄膜厚度,可使透光率在可见光波段有整体上的提升。
AZO thin films were grown on quartz glass by DC magnetron sputtering. The structure, optical and electrical properties of the films were analyzed by X-ray double crystal diffraction (XRD), four-probe and visible light spectrophotometer. Effect of shot time on the crystal structure, film thickness, sheet resistance and transmittance of thin films. Aiming at the application of AZO as current spreading layer in LED, the transmittance of AZO and SiO_2 double-layer films was simulated by optical simulation software TFCalc. The AZO and SiO_2 films were respectively grown by sputtering and PECVD. By adjusting the thickness of the film properly, the transmittance can be improved as a whole in the visible light.