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从第一级过滤到使用点的管道系统,有许多因素决定硅片加工用水的质量。 就像生物本身离不开水一样,水对于半导体生产来说,是至关重要的。生物可以从水的有益成分中获得好处,而半导体生产需要的却是超纯水。 在所有的硅片加工处理过程中,每一块硅片的漂洗要消耗数百加仑的水,水与硅片间的接触使得水中的各种成份都有许多机会沾污硅片,从而造成半导体电路的缺陷,这是现今硅片加工过程中最讨厌的事。 半导体设备与材料协会推荐的超纯水指标,详细列举了目前半导体厂家最为关心的水的各种成份(见表1)。本文为了便于讨论,把这些成分分成以下五个大类: 1.溶解的离子; 2.二氧化硅; 3.细菌; 4.总有机(可氧化的)碳(TOC); 5.各种粒子。
There are many factors that determine the quality of silicon process water from the first stage to the point of use of the pipe system. Just as biology itself can not do without water, water is of crucial importance to semiconductor production. Creatures can benefit from the beneficial ingredients of water, whereas semiconductors require ultrapure water. During all silicon processing, the rinsing of each wafer consumes hundreds of gallons of water. The contact between the water and the silicon allows the various components in the water to have many chances of contaminating the silicon wafer, resulting in a semiconductor circuit This is the most annoying thing in today’s silicon processing. Semiconductor Equipment and Materials Association recommended ultra-pure water indicators, a detailed list of the current semiconductor manufacturers are most concerned about the various components of water (see Table 1). For the purposes of this discussion, these components are grouped into the following five broad categories: 1. Dissolved ions; 2. Silica; 3. Bacteria; 4. Total organic (oxidizable) carbon (TOC); 5. Various particles .