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本文叙述了双室旋转磁控溅射镀膜机的结构、工作原理和主要性能，并对磁场强度、充气压强、放电电压、电流等工作参数以及沉积速率的影响进行了一系列实验，从而选择了该机的最佳运动参数．
This paper describes the structure, working principle and main properties of a dual-chamber rotating magnetron sputter coating machine. A series of experiments were carried out on the effects of magnetic field strength, charge pressure, discharge voltage and current, and deposition rate. The best machine parameters.