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介绍了一种新型离子渗镀钽的工艺方法。较好解决了渗镀钽时供给活性钽粒子的问题。此方法工艺简单，操作方便，效率高。为充分利用和节约使用昂贵的钽探索了一条实用可行的途径。
A new type of ion-permeable tantalum process is introduced. Solve the problem of the supply of active tantalum particles when tantalum plating. The method has the advantages of simple process, convenient operation and high efficiency. Explore a practical way to take full advantage of and save the use of expensive tantalum.