用直流反应磁控溅射法制备ZAO纳米薄膜 ,对这种薄膜进行了XRD分析 ,并对其光、电性能作了详细的研究。结果表明 :ZAO薄膜的结构为标准的ZnO纤锌矿相 ,没有Al2 O3 相出现 ;其最低电阻率为 4 5× 10 -4Ω·cm、可见光透射率在 80 %以上 ,红外波段的反射率达 70 %以上 ,是优质的透明导电膜 ZAO nanostructured films were prepared by DC reactive magnetron sputtering. The films were characterized by XRD and their optical and electrical properties were studied in detail. The results show that the structure of ZAO thin film is a standard ZnO wurtzite phase with no Al 2 O 3 phase. The lowest resistivity is 45 × 10 -4 Ω · cm, the visible light transmittance is above 80% More than 70%, is a high-quality transparent conductive film