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采用8羟基喹啉的碱性水溶液,分别通过循环伏安法和恒电位法在镍基体上电沉积制备了聚8羟基喹啉薄膜。探讨了2种方法制备聚8羟基喹啉薄膜的电化学行为,并对比研究了不同方法所得试样的表面形貌和耐蚀性。结果表明,循环伏安法电沉积聚8羟基喹啉的氧化峰为0.563 V和0.481 V,还原峰则位于0.318 V;恒电位法电沉积聚8羟基喹啉包含聚合物成核和长大2个过程。恒电位法所得聚8羟基喹啉薄膜较循环伏安法所得膜更平整,耐蚀性更好。聚8羟基喹啉薄膜增大了基体表面的电荷转移电阻,隔绝了腐蚀介质,从而有效增强了镍基体的耐蚀性。
Poly (8-hydroxyquinoline) thin films were prepared by electrodeposition of nickel substrate with cyclic voltammetry and potentiostatic method, respectively. The electrochemical behaviors of poly (8-hydroxyquinoline) films prepared by two different methods were discussed. The surface morphology and corrosion resistance of the samples obtained by different methods were compared. The results showed that the oxidation peak of poly (8 - hydroxyquinoline) by cyclic voltammetry was 0.563 V and 0.481 V, and the reduction peak was at 0.318 V. The potentiodynamic electrodeposition poly (8 - hydroxyquinoline) contained polymer nucleation and growth 2 A process. Potentiostatic method poly-8-hydroxyquinoline film obtained by cyclic voltammetry obtained a more smooth film, better corrosion resistance. Poly 8 hydroxyquinoline film increases the charge transfer resistance of the substrate surface, isolated from the corrosive medium, thereby effectively enhancing the corrosion resistance of the nickel substrate.