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采用多靶磁控溅射镀膜机,以在Si靶上加Nb片的方法分别在Cu和单面抛光不锈钢(SS)基底上制备NbSiN/NbSiNO/Si3N4和Mo/NbSiN/NbSiNO/Si3N4多层膜。用α-step台阶仪(DEKTAK IIA)测量膜层厚度,UVPC3100分光光度计和傅里叶红外光谱仪(EXCALIBUR FTS 3000)对样品的光学性质进行表征。实验表明:在Cu基底上制备的涂层吸收率α=0.90,发射率ε=0.12;以SS为基底,红外反射层Mo的厚度约为230nm时,在λ>2.5μm范围内反射率最高,达到90%以上。高金属体积分数吸收层(HMVF)厚度约为80nm时吸收率α=0.95,发射率ε=0.33;真空下500℃和600℃各20h退火后吸收率、发射率变化不大。
A multi-target magnetron sputtering machine was used to fabricate NbSiN / NbSiNO / Si3N4 and Mo / NbSiN / NbSiNO / Si3N4 multilayers on Cu and single-side polished stainless steel (SS) . The film thickness was measured with an α-step stepper (DEKTAK IIA), and the optical properties of the samples were characterized by UVPC3100 spectrophotometer and Fourier transform infrared spectrometer (EXCALIBUR FTS 3000). The experimental results show that the absorptivity of coating prepared on Cu substrate is α = 0.90, the emissivity is ε = 0.12. When SS is the substrate, the reflectivity of Mo is> 230μm, the reflectivity of λ> 2.5μm is the highest, Reached more than 90%. When the thickness of HMVF is about 80nm, the absorptivity α = 0.95 and the emissivity ε = 0.33. The absorptivity and emissivity of the HMVF annealed at 500 ℃ and 600 ℃ under vacuum are almost the same.