光刻自动化是当前国内外发展集成电路工艺设备的重要趋势.本文通过对二个平面刚体的对(淮十)原理的分析,给出对(淮十)方程的一般形式.文中对光电信息的获得与处理,按宽度调制的断续调节系统,硅片高反差标记符号等方面进行了理论分析,指出了解决问题的途径.文中对系统的误差和实验结果也作了分析. Automation of photolithography is an important trend in the development of integrated circuit technology at home and abroad.Through the analysis of the principle of two planar rigid bodies, this paper gives the general form of the (Huai-ten) equation.In this paper, Acquisition and processing, intermittent adjustment system based on width modulation, high-contrast marks of silicon wafer and so on, and pointed out the ways to solve the problem.The errors and experimental results of the system are also analyzed in this paper.