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建立一个描述低能电子在多元多层介质中散射的物理模型 ,运用MonteCarlo方法模拟低能电子在靶体胶衬底中的复杂散射过程 ,在此基础上通过大量计算研究入射束能、胶层厚度、衬底材料等不同曝光条件对抗蚀剂沉积能密度分布的影响 ,获得沉积能分布规律 :适量的低束能、薄胶层、低原子序数衬底可以使前散射电子对胶中沉积能密度分布的贡献增大、背散射电子的贡献减小 ,从而提高曝光分辨率 .
A physical model describing the scattering of low-energy electrons in a multi-layer multi-layer medium is established. MonteCarlo method is used to simulate the complex scattering process of low-energy electrons in a target glue substrate. Based on this, Substrate material and other exposure conditions on the deposition density of resist deposition, to obtain the distribution of deposition energy: appropriate amount of low beam energy, a thin layer of glue, low atomic number substrate can make the pre-scattering electron on the deposition of plastic density distribution The contribution of the backscattered electrons decreases, thereby increasing the exposure resolution.