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脉冲CO_2激光激发SP_6引起UF_6光敏解离近来已有报道。我们曾研究以H_2为清扫剂的UF_6红外光敏反应,但用一氧化碳作为F原子清扫剂的详细研究尚未见报道。本文着重研究TEA CO_2激光诱导SF_6—UF_6—CO体系的光敏反应,并测定了UF_6解离率与激光能量密度、频率和CO分压之间的关系。
Pulsed CO_2 laser induced SP_6 induced UF_6 photodissociation has been reported recently. We have studied H 2 as a cleaning agent UF_6 infrared photoreaction, but the use of carbon monoxide as a F atom cleaning agent has not been reported in detail. In this paper, the photoreaction of TE_6-UF_6-CO system induced by TEA CO_2 laser was studied emphatically. The relationship between the dissociation rate of UF_6 and the laser energy density, frequency and CO partial pressure was also studied.