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用原子吸收光谱和X射线荧光光谱,测得Ni在Si中的分布为内部浓度低,表面浓度高的U形分布。扫描电子显微镜观察到了Ni在Si表面的沉积和由此产生的晶格缺陷。表面沉积物是Si—Ni合金,其原子比为Si:Ni—2:1。
Using atomic absorption spectroscopy and X-ray fluorescence spectroscopy, the distribution of Ni in Si was found to be a U-shaped distribution with low internal concentration and high surface concentration. Scanning electron microscopy shows the deposition of Ni on the Si surface and the resulting lattice defects. The surface deposit is a Si-Ni alloy with an atomic ratio of Si: Ni-2: 1.