论文部分内容阅读
面向可用作压印模板的透明高硬微/纳米结构的低成本制备,无机高分子全氢聚硅氮烷用甲基丙烯酸(2-异氰酸基乙酯)进行光敏改性,经FTIR,1H-NMR,13C-NMR等手段表征,推断获得的是甲基丙烯酸酯化的全氢聚硅氮烷(MPHPS),并以此为原料,用一种含氟聚合物(FP)模板,施加0.1～0.4 MPa的压力,紫外压印制备MPHPS的微结构,发现增加压力,压印复制效果提高,0.23 MPa可以完全复制FP模板的微结构.此外,在0.4 MPa的压力下也制备了分辨率为90 nm,70 nm的纳米级结构.随后在碱性条件下室温水解,MPHPS聚合物结构转化为Si—O无机结构,最终获得透明高硬结构,硬度4.5×103MPa,弹性模量115×103MPa.
For low-cost production of transparent high-hardness micro / nanostructures that can be used as an imprint template, the inorganic polymeric perhydropolysilazane is photo-modified with methacrylic acid (2-isocyanatoethyl ester) and subjected to FTIR , 1H-NMR, 13C-NMR and so on. It was deduced that methacrylicated perhydropolysilazane (MPHPS) was obtained and used as a raw material. A fluoropolymer (FP) Under the pressure of 0.1-0.4 MPa, the microstructure of MPHPS was prepared by UV imprinting, and it was found that the increase of pressure resulted in an increase of imprinting and duplication effect, and the microstructure of FP template could be completely replicated at 0.23 MPa. In addition, Rate of 90 nm, 70 nm nanoscale structure.After then hydrolyzed at room temperature under alkaline conditions, MPHPS polymer structure into Si-O inorganic structure, the final transparent high hardness structure, hardness 4.5 × 103MPa, elastic modulus 115 × 103MPa.