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用直流反应磁控溅射法在普通玻璃上制备了 Alx Ti1 - x N(x<0 .42 )薄膜 ,用 X射线光电子能谱 (XPS)、紫外可见光谱和椭圆偏振仪研究了铝离子含量对 Ti N薄膜光学性能的影响。结果表明 ,铝离子含量主要影响 Ti N薄膜的消光系数
AlxTi1 - xN (x <0.42) thin films were prepared on ordinary glass by direct current reactive magnetron sputtering. The content of Al2 + was measured by X - ray photoelectron spectroscopy (XPS) Effect on the Optical Properties of TiN Films. The results show that the content of aluminum ions mainly affects the extinction coefficient of TiN thin films