Chemical mechanical polishing(CMP)is a manufacturing process used to achieve required high levels of global and local planarity,which involves a combination of
The nature of zero-knowledge is re-examined and the evidence for the following belief is shown:the classic simulation based definitions of zero-knowledge(simula
By using an ensemble-averaged two-fluid model,with valid closure conditions of interfacial momentum exchange due to virtual mass force,viscous shear stress and
Rainbow trout histone H3(RH3)promoter was cloned via high fidelity PCR.The cloned RH3 promoter was inserted into a promoter-lacked vector pEGFP-1,resulting in a
The component and amount of nutrient in the growth medium are the major factors affecting root growth.For the systematic dissection of root gene expression,eval