使用无限微元法对霍尔槽阴极初级电流分布进行了理论探讨，推导出霍尔槽阴极初级电流分布公式为：Ｄｋ＝Ｉｍ［Ａ＋Ｂｌｇ（Ｌｓｉｎθ＋α）］。公式所得结果能正确解释电镀生产中的一些因素对镀层质量的影响，并对非直流电镀具有一定的指导意义 In this paper, the elementary current distribution of the cathode in the Hall cell is theoretically investigated by using the finite element method. The formula for the primary current distribution in the cathode of the Hall cell is deduced as follows: Dk = Im [A + Blg (Lsinθ + α)]. The results of the formula can correctly explain the impact of some factors in the electroplating production on the quality of the coating, and has some guiding significance for non-DC plating