一、前言在半导体材料的衬底或外延片上用化学腐蚀法对样品进行腐蚀是集成光学中制作集成光路器件的一种途径。例如:分束器、反射器,分布反馈激光器,分布布拉格反馈激光器,脊形波导以及各种特种形状的激光器等,根据各种器件的不同要求选择不同的腐蚀液是制作器件必须了解的第一步。如制备分布反馈激光器,由于要求分辨率高,腐蚀面光亮,结构精细,需要严格控制,应当选择慢腐蚀液,而在脊形波导中,由于条宽、大面积腐蚀,选择快腐蚀液。最近几年,随着光纤通讯事业的发展, I. INTRODUCTION Corrosion of samples by chemical etching on substrates or epitaxial wafers of semiconducting materials is one way of making integrated optics in integrated optics. For example, beam splitters, reflectors, distributed feedback lasers, distributed Bragg feedback lasers, ridge waveguides, lasers of various special shapes, etc. The choice of different etching solutions according to different requirements of various devices is the first step. Such as the preparation of distributed feedback lasers, due to the requirements of high resolution, bright surface corrosion, fine structure, the need for strict control, should choose a slow etching solution, and in the ridge waveguide, due to the wide strip, large area corrosion, select the fast etching solution. In recent years, with the development of optical fiber communications,