1、绪言所谓直流等离子CVD法,就是把反应气体TiCl_4、CH_4和N_2引入到由气体辉光放电产生的非平衡等离子体内,以提高反应离子的势能,大幅度降低CVD法的沉积温度,制取TiC、TiN和TiCxN_y等超硬化合物涂层。这样,不但能克服CVD法沉积温度高、容易使基体产生变形的缺点,也可以克服PVD法存在的涂层和基体结合强度差的缺点。因此,直流等离子CVD法,必将得到迅速发展,广泛应用。 Introduction The so-called DC plasma CVD method is to introduce the reactive gases TiCl 4, CH 4 and N 2 into the non-equilibrium plasma generated by gas glow discharge to improve the potential energy of the reactive ions and greatly reduce the deposition temperature of the CVD method. TiC, TiN and TiCxN_y superhard compound coating. In this way, the method can not only overcome the disadvantage of high deposition temperature of the CVD method and easy deformation of the substrate, but also overcome the poor bonding strength between the coating and the substrate due to the PVD method. Therefore, the DC plasma CVD method will surely get rapid development and be widely used.