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采用磁控溅射法分别在柔性PI衬底、柔性AZO衬底和柔性ITO衬底上制备CdS薄膜，并在干燥空气中以CdCl2为源380℃退火，分别研究了不同柔性衬底及退火工艺对CdS薄膜形貌、结构和光学性能的影响。研究结果表明：退火前在不同柔性衬底上的CdS薄膜形貌依赖于衬底类型，退火后CdS薄膜的晶粒再结晶，晶粒度增大明显，且不再依赖于衬底类型。不同柔性衬底上CdS薄膜均为立方相和六角相的混相结构，退火后，六角相比例增大，薄膜的结晶质量提高。透过率退火后改善明显，其中，在柔性AZO衬底上的CdS薄膜透过率超过80%。“,”The CdS thin films were prepared on Flexible PI、AZO and ITO substrates by r.f. magnetron sputtering technique,and annealed at 380℃ in CdCl2 and dry air. The morphology, structure and optical properties of all samples were characterized by the scanning electron microscopy, X-ray diffraction and ultraviolet-visible spectroscopy. The results show that the microstructures of all the CdS thin films dependent on the type of substrate by as-deposited and annealed CdS thin films on different substrates, grain recrystallizes, grain size increases significantly and no longer depend on the substrate type. The entire prepared CdS thin films show a mixed phase structure of cubic and hexagonal. After annealing, the proportion of hexagonal phase is increased, the crystallization quality of CdS thin film is improved. The optical transmittance changes obviously after annealing, among them, the optical transmittance of CdS thin film on flexible AZO substrate is over 80%.