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本文采用多功能电子能谱仪，通过俄歇电子能谱AES和X光电子能谱，对在浓盐酸介质中的铸造镍铬合金的钝化膜进行了分析与研究。结果表明，该合金在50℃、36％HCl介质中，形成了一种含有Cl、Mo为主的氧化物膜。这层薄膜主要是Mo以MoO3形式在表面层富集，Ni在膜中主要以Ni2O3富集在膜的底部，因而提高了膜的稳定性。本试验中采用电化学方法形成的钝化膜厚度大约为10nm，过渡层厚度大约为15nm.
In this paper, multi-functional electron spectrometer, Auger electron spectroscopy AES and X-ray photoelectron spectroscopy, in concentrated hydrochloric acid medium cast nickel-chromium alloy passivation film were analyzed and studied. The results show that an oxide film containing Cl and Mo is formed in the medium of 36% HCl at 50 ℃. The film mainly contains Mo in the form of MoO3 in the surface layer, and Ni is mainly concentrated in the film at the bottom of the film by Ni2O3, thereby improving the stability of the film. The thickness of passivation film formed by electrochemical method in this experiment is about 10nm, and the thickness of the transition layer is about 15nm.