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采用磁控溅射技术,分别在康宁玻璃、硅片和NdFeB合金基材表面沉积一层非晶的Ti-B基涂层。非晶Ti-B基涂层可以消除磁控溅射常见的柱状晶结构。利用XRD,SEM,纳米压痕仪和电化学工作站对涂层的结构、力学性能和耐蚀行为进行表征。结果表明:通过工艺控制,获得了密度分别为4.04,4.27和4.61 g/cm~3的Ti-B基涂层。所获得的Ti-B基涂层呈现均匀、致密的非晶结构,消除了常见的柱状晶结构。非晶Ti-B基涂层的力学和耐蚀性能与其密度紧密相关。当密度提高14.11%时,硅片基底涂层的硬度提高了49.01%,NdFeB基底涂层的腐蚀电流密度降低了66.67%。当密度为4.61 g/cm~3时,Si片上涂层的硬度和塑性指数分别是30.1 GPa和0.48;对于NdFeB基底在3.5%(质量分数)NaCl溶液中腐蚀电流密度为1.34×10~(-6)A/cm~2,约为纯基材腐蚀电流密度的1/8;腐蚀电位为-0.689 V,相对于基材正移0.220 V。说明该非晶涂层对NdFeB基材具有较好的耐蚀保护作用。
Using magnetron sputtering technique, an amorphous Ti-B based coating was deposited on Corning glass, silicon wafer and NdFeB alloy substrate, respectively. Amorphous Ti-B-based coatings eliminate the columnar crystal structure common to magnetron sputtering. The structure, mechanical properties and corrosion resistance of the coatings were characterized by XRD, SEM, nanoindentation and electrochemical workstation. The results show that Ti-B-based coatings with density of 4.04, 4.27 and 4.61 g / cm ~ 3 were obtained through process control. The obtained Ti-B based coating shows a uniform and dense amorphous structure and eliminates the common columnar crystal structure. The mechanical and corrosion properties of amorphous Ti-B-based coatings are closely related to their density. When the density is increased by 14.11%, the hardness of silicon wafer base coating is increased by 49.01%, and the corrosion current density of NdFeB base coating is reduced by 66.67%. When the density is 4.61 g / cm ~ 3, the hardness and plasticity index of Si coating are 30.1 GPa and 0.48, respectively. The corrosion current density of NdFeB substrate in 3.5% NaCl solution is 1.34 × 10 ~ 6) A / cm ~ 2, which is about 1/8 of that of the pure substrate. The corrosion potential is -0.689 V, which is 0.220 V with respect to the substrate. Indicating that the amorphous coating on the NdFeB substrate has a good corrosion protection.