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采用磁控溅射法制备了Mg2Ni贮氢薄膜,考察了不同基体及基体温度对薄膜组织结构的影响。实验结果表明,Mg2Ni薄膜的表面形貌与衬底类型及衬底温度有关。玻璃片上溅射沉积的膜的表面形貌表面较为平整,而未抛光的Ni片上沉积的薄膜的生长明显存在着沿划痕方向生长的趋势,存在择优取向。另外,当基体温度升高时,薄膜的晶粒尺寸增大。
Mg2Ni hydrogen storage films were prepared by magnetron sputtering. The effects of different substrate and substrate temperatures on the microstructure of the films were investigated. The experimental results show that the surface morphology of Mg2Ni thin films is related to the substrate type and substrate temperature. The surface morphology of the film deposited by sputtering on glass was smooth, while the growth of the film deposited on the unpolished Ni film obviously showed the tendency to grow along the scratch direction, and the preferential orientation existed. In addition, as the substrate temperature increases, the grain size of the film increases.