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详细介绍了二元光学元件制作的光刻技术和一些新的制作工艺，包括薄膜沉积法、激光束或电子束直接写入法和准分子激光加工法．针对用于ＣＯ２激光器模式优化的二元光学反射镜，分析了元件制作误差，包括掩模对准误差、台阶刻蚀深度误差和台阶刻蚀宽度误差对谐振腔振荡模式的影响．
This paper introduces in detail the lithography technology and some new fabrication techniques of binary optics, including thin film deposition method, laser beam or electron beam direct writing method and excimer laser processing method. The effects of mask fabrication error, step depth error and step width error on resonator oscillation mode were analyzed for the binary optical mirror used in CO2 laser mode optimization.