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本文介绍了用PECVD技术淀积NO_x敏感的工艺,并对典型工艺参数条件进行了讨论。我们淀积的这种NO_x敏感膜,不仅在旁热情况下对NO_x敏感,而且在室温条件下也能对NO_x气体敏感。最后,我们对室温NO_x气体传感器的一些重要性能指标进行了研究。
This paper describes the NO_x-sensitive deposition process using PECVD technology and discusses the typical process parameters. The NO_x-sensitive membrane we deposited is sensitive to NO_x not only in the presence of side heat but also to NO_x gas at room temperature. Finally, we study some important performance indicators of room temperature NO_x gas sensors.