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Multilayer films of 2-hydroxy-4,4’-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy,temperature-dependent FTIR,and X-Ray diffraction technique. The results show that the multilayer films are formed by stacking of HAB monolayers via π-π interactions and the adjacent two monolayers in the film are arranged in an asymmetric way in the multilayer films.
Multilayer films of 2-hydroxy-4,4’-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy, temperature-dependent FTIR, and X-ray diffraction techniques. by stacking of HAB monolayers via π-π interactions and the adjacent two monolayers in the multilayer films are arranged in an asymmetric way.