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椭偏技术是一种分析表面的光学方法,通过测量被测对象(样品)反射出的光线的偏振状态的变化情况来研究被测物质的性质。结合XRD和原子力显微镜等方法,利用椭圆偏振光谱仪测试了单层SiO2薄膜(K9基片)和单层HfO2薄膜(K9基片)的椭偏参数,并用Sellmeier模型和Cauchy模型对两种薄膜进行拟合,获得了SiO2薄膜和HfO2薄膜在300～800 nm波段内的色散关系。用X射线衍射仪确定薄膜结构,用原子力显微镜观察薄膜的微观形貌,分析表明:SiO2薄膜晶相结构呈现无定型结构,HfO2薄膜的晶相结构呈现单斜相结构;薄膜光学常数的大小和薄膜的表面形貌有关;Sellmeier和Cauchy模型较好地描述了该波段内薄膜的光学性能,并得到薄膜的折射率和消光系数等光学常数随波长的变化规律。
Ellipsometry is an optical method of analyzing surfaces that studies the properties of a measured substance by measuring the change in the polarization state of the light reflected by the measured object (sample). The ellipsometric parameters of monolayer SiO2 film (K9 substrate) and monolayer HfO2 film (K9 substrate) were measured by XRD and AFM. The two films were tested by Sellmeier model and Cauchy model The relationship between the dispersion of SiO2 film and HfO2 film in the wavelength range of 300-800 nm was obtained. The structure of the film was observed by X-ray diffractometer. The microstructure of the film was observed by atomic force microscopy. The crystal structure of the film was amorphous, and the crystal structure of HfO2 film was monoclinic. The size of the film’s optical constants and The Sellmeier and Cauchy models describe the optical properties of the films well, and the optical constants of the films such as refractive index and extinction coefficient with the wavelength are obtained.