【摘 要】
：
A series of ablation experiments on silicon surface by femtosecond laser system of 775 nm and 150 fs duration pulses were carried out.The morphological characte
【机 构】
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State Key Laboratory of Precision Measuring Technology and Instruments
论文部分内容阅读
A series of ablation experiments on silicon surface by femtosecond laser system of 775 nm and 150 fs duration pulses were carried out.The morphological characteristics and the associated effect in the ablation were tested by atomic force microscope (AFM),scanning electron microscope (SEM),focused ion beam (FIB),and the optic microscope.The single pulse threshold can be obtained directly.For the multiple pulses,the ablation threshold varies with the number of pulses applied to the surface due to the incubation effect.By analyzing the experimental data,the thresholds of laser fluences under various laser pulse numbers were obtained,and the relationships between ablation area and laser energy and laser pulse number were concluded.Meanwhile,the periodic ripple structure on silicon surface was found.Under the condition of certain laser power,the number of laser pulse can influence the formation of ripples.
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