【机 构】
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DepartmentofElectricalandComputerEngineering,NationalUniversityofSingapore,4EngineeringDrive3,117576
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A tunable plasmonic perfect absorber with a tuning range of ～650 nm is realized by introducing a 20 nm thick phase-change material Ge2Sb2Te5 layer into the metal–dielectric–metal configuration. The absorption at the plasmonic resonance is kept above 0.96 across the whole tuning range. In this work we study this extraordinary optical response numerically and reveal the geometric conditions which support this phenomenon. This work shows a promising route to achieve tunable plasmonic devices for multi-band optical modulation, communication, and thermal imaging.
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