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多层介质膜光栅是高功率激光系统的关键光学元件.为了满足国内强激光系统的迫切需求,在大口径多层介质膜光栅的研制过程中,建立了单波长自准直条件下的衍射效率测量方法及其误差分析.结果表明误差主要由探测器的噪声和测试人员的差异产生,对衍射效率测试精度的影响是±1%.在此基础上,将光栅衍射效率及其分布测量技术应用于光栅制作工艺中,作为大口径光栅无损检测的一种手段,如判断光栅掩模是否能进行离子束刻蚀、离子束刻蚀的在线监测和是否需要再刻蚀,从而实现对大口径多层介质膜光栅离子束刻蚀过程的定量、科学控制,提高了离子束刻蚀光栅制作工艺的成功率.利用上述技术,已成功研制出多块最大尺寸为430 mm×350 mm、线密度1740线/mm、平均衍射效率大于95%的多层介质膜光栅.实验结果表明,该方法操作简单、测量快速准确,不必检测光栅微结构.为大口径多层介质膜光栅研制的无损检测工程化奠定了基础.
In order to meet the urgent need of domestic strong laser system, the multi-layer dielectric film grating is the key optical element in high power laser system. In the process of developing large aperture multi-layer dielectric film grating, the diffraction efficiency under single wavelength self-collimation Measuring method and error analysis.The results show that the error is mainly caused by the difference between the detector noise and the tester, and the influence on the diffraction efficiency test accuracy is ± 1% .Based on this, the application of grating diffraction efficiency and its distribution measurement technology In the grating manufacturing process, as a means of non-destructive testing of large-aperture gratings, such as determining whether the grating mask can perform ion beam etching, on-line monitoring of ion beam etching and whether it needs re-etching, Layer dielectric film grating ion beam etching process quantitative and scientific control to improve the success rate of ion beam etching grating production process using the above technology has successfully developed a number of pieces of the largest size of 430 mm × 350 mm, the linear density of 1740 Line / mm, the average diffraction efficiency of more than 95% of the dielectric film grating.The experimental results show that the method is simple, fast and accurate measurement, without having to detect grating micro Configuration. Foundation for the large-diameter multilayer dielectric grating engineered NDT developed.