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化学气相沉积 (ChemicalVaporDeposition ,CVD)技术可用在高熔点金属如Mo、Re、W等表面制备结合力好的铂族金属涂层。用CVD法可得到具有微细晶粒的致密金属 (无针孔 )涂层 ,可制成大形状和形状复杂的制品 ,也可用于合金涂层的制备。本文介绍了该项技术的国外发展概况 ,并以高温抗氧化铱涂层 (可耐受 2 0 0 0℃高温 )为代表 ,叙述了铂族金属涂层的特点以及该项技术在制备涂层过程中的基本步骤 ,并对工艺参数等各项技术特点进行了系统评述。
Chemical vapor deposition (CVD) technology can be used in the preparation of high-melting point metal such as Mo, Re, W and other surface preparation of good bonding platinum group metal coating. The use of CVD can be obtained with a fine grain of dense metal (no pinhole) coating, can be made of large shapes and complex shapes, can also be used for alloy coating preparation. This paper introduces the overseas development of the technology, and describes the characteristics of the platinum group metal coating with the high temperature anti-oxidation iridium coating (which can withstand the high temperature of 2000 degrees Celsius) and the application of the technology in the preparation of the coating Process of the basic steps, and process parameters and other technical characteristics of a systematic review.