通过磁控溅射方法制备了Ag掺杂Cu2O纳米薄膜。用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、X射线光电能谱(XPS)和荧光光谱仪(FLO)对薄膜的晶体结构、表面形貌、表面性能和光催化性能进行了分析。研究表明,Ag的掺杂使得Cu2O薄膜表面粗糙度增加、光生电子和空穴的复合率降低,并且可见光催化活性明显提高;在光照120min后,降解率达到了50%以上;Ag掺杂也了改进了薄膜的稳定性和可重复性。 Ag-doped Cu2O nanostructured films were prepared by magnetron sputtering. The crystal structure, surface morphology, surface properties and photocatalytic properties of the films were characterized by XRD, SEM, XPS and FLO. The results show that the doping of Ag makes the surface roughness of Cu2O film increase, the recombination rate of photogenerated electron and hole decreases, and the photocatalytic activity increases obviously; the degradation rate reaches more than 50% after 120 min illumination; Improved film stability and repeatability.