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一、引言 离子注入表面改性是六十年代由多种学科交叉发展起来的一门新兴边缘技术。开始用于半导体集成电路的渗杂工艺,它可以独立地实现本体和表面的分别优化。 离子注入是将高能量的束流离子以高速射入固体材料表面,通过离子与材料表面的相互作用而改变材料表面的物理、化学及机
I. INTRODUCTION Ion implantation surface modification is an emerging edge technology developed by many disciplines in the 1960s. Beginning with a hybridization process for semiconductor integrated circuits, it is possible to independently optimize the body and the surface, respectively. Ion implantation is the beam of high-energy ions at high speed into the solid material surface, through the interaction of ions and the surface of the material to change the physical, chemical and mechanical surface