利用介质阻挡放电,在常压下进行非平衡等离子体渗氮通过正交试验研究渗氮工艺参数的作用,分析渗氮膜层的相结构及其显微组织,确定常压下较为理想的渗氮工艺参数.试验结果表明,新工艺能在较短时间内获得较高的表面硬度与理想的扩散层;整个工艺过程操作简便,省去了真空放电下必需的真空设备,是一种极具发展前景的新型渗氮工艺. Using dielectric barrier discharge, under non-equilibrium plasma nitriding at atmospheric pressure, the effect of nitriding process parameters was studied by orthogonal test. The phase structure and microstructure of nitriding layer were analyzed to determine the ideal infiltration Nitrogen process parameters.Experimental results show that the new process can obtain higher surface hardness and ideal diffusion layer in a short period of time.The operation of the whole process is simple and convenient and eliminates the necessary vacuum equipment under vacuum discharge, Development of new nitriding process.