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实验淀积膜所用设备的结构图示于图1。由扩散泵浦真空系统产生的基本压力为10~(-4)Pa。用电子束蒸发器淀积薄膜。25mm直径BK7抛光玻璃试验衬底装在蒸发料源上方420mm处,可用Kanfman离子枪以34°入射再辐照。膜淀积的光学控制是由透射或反射光完成。采用离子束进行辅助淀积的所有试样,所用氩离子能量为700eV,离子束电流密度为150mAm(-2)(像法拉弟帽所测的那样)。并设想将离子束能量或电流最佳化。通过淀积光透过率约为5％的对溶剂灵敏的银和铝膜来制备试样(这透过率对
The structure of the apparatus used to experimentally deposit the film is shown in FIG. 1. The basic pressure generated by diffusion pump vacuum system is 10 ~ (-4) Pa. The film was deposited using an electron beam evaporator. A 25 mm diameter BK7 polished glass test substrate was mounted 420 mm above the source of the evaporation and was irradiated with a Kanfman ion gun at an incident angle of 34 °. The optical control of film deposition is accomplished by transmitted or reflected light. All samples assisted by the ion beam were deposited using an argon ion energy of 700 eV and a beam current density of 150 mAm (-2) as measured by a Faraday cap. And envisages optimizing the ion beam energy or current. Samples were prepared by depositing solvent-sensitive silver and aluminum films with a light transmission of about 5% (this transmittance was