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为了实验室和工业的需要,现代化的等离子热处理工艺对设备提出了新的特殊要求。直流脉冲技术用于大电流辉光放电,可以满足这些要求。—不同的等离子工艺参数可以彼此独立地调节。—输入的平均等离子能量与等离子的物理状态分开,故可以保持极低的处理温度—装炉零件的能量平衡和温度分布可在很宽的范围内调节,并可用辅助加热。—避免了形成打弧。这项技术是等离子热处理进一步发展的重要一步。
For laboratory and industrial needs, modern plasma heat treatment processes place new special requirements on the equipment. DC pulse technology for high-current glow discharge, to meet these requirements. Different plasma process parameters can be adjusted independently of one another. - The average input plasma energy is separated from the plasma physical condition so that very low processing temperatures can be maintained - the energy balance and temperature distribution of the furnace components can be adjusted over a wide range and with auxiliary heating. - Avoid the formation of arcs. This technology is an important step toward further development of plasma heat treatment.