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对SDS－2型电子束曝光机偏放系统进行了电磁场、电源、数字信号等三方面的抗干扰改造，因而扫描系统的干扰得到了较好的抑制，使用改造后的偏放系统扫出的版，图形质量和线条分辨率都得到了提高。
The anti-interference of electromagnetic field, power supply, digital signal and other three aspects of the SDS-2 electron beam exposure machine bias system was modified, so the interference of the scanning system was better suppressed, and the modified partial deflection system was used to sweep out Version, graphics quality and line resolution have been improved.