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Pure TiO_2,Fe_2O_3 and SnO_2 are wide-bandgap semiconductors.Their films have high transparency in visible spectral region.These oxide films have been applied to electronics,optoelectronics, solar cells and display devices.A variety of techniques including reactive sputtering,reactive evaporation, ion-beam evaporation and chemical vapor deposition, and hydrolyses of the respective halides or alkoxides have been employed for the growth of thin films of TiO_2,Fe_2O_3 and SnO_2.In
Pure TiO 2, Fe 2 O 3 and SnO 2 are wide-bandgap semiconductors. The films have high transparency in visible spectral regions. The oxide films have been applied to electronics, optoelectronics, solar cells and display devices. A variety of techniques including reactive sputtering, reactive evaporation, ion-beam evaporation and chemical vapor deposition, and hydrolyses of the respective halides or alkoxides have been employed for the growth of thin films of TiO_2, Fe_2O_3 and SnO_2.In