采用磁控溅射方法在Si(001)制备ZnO薄膜,利用原子力显微镜对不同退火温度的ZnO薄膜表面形貌进行表征.结果表明:薄膜的微观形貌、表面粗糙度和分形维数取决于退火温度的变化.在退火温度从室温上升到1000℃过程中,薄膜表面粗糙度逐渐降低,700℃降至最小,而后又迅速粗糙.探讨了不同退火温度下薄膜表面的粗糙机理. The ZnO thin films were prepared by magnetron sputtering in Si (001) and characterized by atomic force microscopy. The results showed that the morphology, surface roughness and fractal dimension of ZnO thin films were determined by annealing Temperature.When annealing temperature rises from room temperature to 1000 ℃, the surface roughness of the film gradually decreases and decreases to a minimum at 700 ℃, and then rapidly roughens.The roughness mechanism of the film surface at different annealing temperature is discussed.