论文部分内容阅读
随着激光基准系统和高精度激光测量系统的发展和应用,推动了超低损耗薄膜技术的发展,进一步控制损耗各分量的大小和分布,需要对光学薄膜总损耗进行测试分析。采用DIBS镀膜工艺在超光滑基底上镀制了高反膜和减反膜,给出了镀膜的工艺方法及工艺参数。通过分析时间衰减法测试总损耗的原理,分别采用时间衰减法和频率扫描法测试了光学薄膜的总损耗,在632.8nm波长点的测试结果为:高反膜层吸收为19.6×10-6,反射率达到99.99686%;减反膜层总损耗为78×10-6。最后对光学薄膜总损耗的构成和工艺改进进行了探讨。
With the development and application of laser reference system and high-precision laser measurement system, the development of ultra-low loss thin film technology is promoted. To further control the size and distribution of loss components, the total loss of optical film needs to be tested and analyzed. DIBS coating process is used to coat high antireflective film and antireflective film on the ultra-smooth substrate. The technological process and process parameters of the coating are given. By analyzing the principle of time attenuation method to test the total loss, the total loss of the optical film was tested by the time decay method and the frequency scanning method respectively. The test result at the wavelength of 632.8 nm was that the absorption of the high film layer was 19.6 × 10 -6, Reflectance reached 99.99686%; antireflective layer total loss of 78 × 10-6. Finally, the composition and process improvement of total loss of optical film are discussed.