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根据Ni-Mn-Ga合金靶材在磁控溅射过程中各元素溅射产额和靶材成分的不同,对薄膜成分的影响进行了分析,从而制备了马氏体转变温度高于室温的Ni55Mn24.5Ga20.5靶材。针对目前没有标准的Ni-Mn-Ga马氏体PDF卡片,使用模拟结合已有文献的方法对制备的合金X射线衍射峰进行标定。由于差示扫描量热仪(DSC)不容易对薄膜进行相转变温度测定,提出了利用马氏体与母相磁性能的磁矩与温度(M-T)曲线来测定薄膜的相转变温度,并对合金进行了验证。居里温度约为450K的合金的制备,为进一步探索薄膜成分对磁性能的影响提供了实验依据。
According to the difference of sputter yield and target composition of each element of Ni-Mn-Ga alloy target during magnetron sputtering, the influence of film composition was analyzed, and the martensitic transformation temperature was higher than room temperature Ni55Mn24.5Ga20.5 target. In the absence of standard Ni-Mn-Ga martensite PDFs, the X-ray diffraction peaks of the prepared alloys were calibrated using a combination of simulation and literature methods. Since DSC is not easy to measure the phase transition temperature of the film, the phase transition temperature of the film is determined by using the magnetic and temperature (MT) curve of the martensitic and magnetic properties of the matrix. Alloy was verified. Curie temperature of about 450K alloy preparation, in order to further explore the composition of the film on the magnetic properties provide an experimental basis.