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研究了溅射功率对 Ｇｅ２Ｓｂ２Ｔｅ５ 薄膜的光学常数与波长关系的影响，结果表明，在波长小于 ５００ｎｍ的情况下，随溅射功率的增加非晶态薄膜的折射率ｎ先增加然后减小，消光系数Ｋ则逐渐减小； 在波长大于 ５００ｎｍ的情况下，随溅射功率的增加折射率 ｎ逐渐减少，消光系数ｋ先减小后增加．对于晶 态薄膜样品，在整个波长范围折射率ｎ随溅射功率的增加先减小后增加，消光系数ｋ则逐渐减少．薄膜样 品的光学常数，在长波长范围随波长变化较大，在短波长范围变化较小．讨论了溅射功率对 Ｇｅ２Ｓｂ２Ｔｅ５ 薄膜的光学常数影响的机理．
The effect of sputtering power on the optical constants and wavelength of Ge2Sb2Te5 films was investigated. The results show that the refractive index n of amorphous films increases and then decreases with the increase of sputtering power at the wavelength less than 500 nm. The extinction coefficient K decreases gradually. When the wavelength is more than 500 nm, the refractive index n decreases with the increase of sputtering power, and the extinction coefficient k decreases first and then increases. For crystalline thin film samples, the refractive index n decreases first and then increases with the increase of sputtering power in the whole wavelength range, and the extinction coefficient k decreases gradually. The optical constants of thin film samples vary greatly with wavelength in the long wavelength range and less in the short wavelength range. The mechanism of the influence of sputtering power on the optical constants of Ge2Sb2Te5 films is discussed.