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248 nm的Kr F准分子激光器在光刻、科研等领域有重要的应用。研制了一台用于刻写光纤布拉格光栅的准分子激光器,设计并完善激光器的机械结构,分析了激光器的均匀放电、预电离等关键技术。通过研究充电电压、工作气体配比和总的工作气体压力对输出激光能量和效率的影响,优化激光器的性能;并对光斑均匀性、光束发散角和能量稳定性进行了测试和计算。该准分子激光器的重复频率为1~50 Hz,最高输出效率达2.0%,单脉冲输出能量最高达360 m J,当工作电压不低于24 k V时,激光输出能量不稳定度小于1.8%。用该激光器作为光源采用静态相位掩模法在光纤内刻写布拉格光栅,并对刻写结果进行分析和讨论。
The Kr F excimer laser at 248 nm has important applications in lithography, research and other fields. An excimer laser for writing fiber Bragg gratings was developed. The mechanical structure of the laser was designed and improved. The key technologies such as uniform discharge and preionization were analyzed. The effects of charging voltage, working gas ratio and total working gas pressure on output laser energy and efficiency were studied to optimize the performance of the laser. The spot uniformity, beam divergence angle and energy stability were tested and calculated. The excimer laser has a repetition frequency of 1 ~ 50 Hz, a maximum output efficiency of 2.0% and a single pulse output of up to 360 mJ. When the operating voltage is not lower than 24 kV, the laser output energy instability is less than 1.8% . Using the laser as a light source, a static phase mask method is used to write the Bragg gratings in the optical fiber, and the result of the inscription writing is analyzed and discussed.